| 摘要 |
<p>PURPOSE: A mask for microlens and a formation method of the same are provided to simplify a process while reducing production costs by forming the microlens with only photolithographic process while removing reflow process. CONSTITUTION: In a mask for microlens and a formation method of the same, a mask(100) comprises a first layer(110) and a second level(120) of a substrate type. The first layer includes a quartz substrate transmitting light. . The second level is formed on the first layer into a pattern type. The side of the pattern is comprised of a multi-step and passes light by various levels. The second layer is comprised of at least one of molybdenum and silicon.</p> |
