APPARATUS FOR MAKING THIN FILM

摘要

PURPOSE: A thin film depositing apparatus is provided to install a gas leak preventing member between a coupling member and a reactor, thereby preventing the reaction gas of the reactor from being leaked. CONSTITUTION: A support unit(120) supports a deposition object(11). A driving unit(140) vertically transfers the support unit. A heating unit(150) heats the deposition object and a reaction gas. A reaction gas supply unit(160) includes a reaction gas supply pipe(161) which supplies a reaction gas into a reactor. A pressure detecting unit(190) detects the internal gas pressure of the reactor.