| 发明名称 |
Chemical etching composition for the preparation of 3-D nano-structures |
| 摘要 |
A method of using a chemical compound as an etchant for the removal of unmodified areas of a chalcogenide-based glass, while leaving the imagewise modified areas un-removed, wherein the compound contains a secondary amine, R1 R2 NH, with R1 and/or R2 having a sterically bulky group with more than 5 atoms.
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| 申请公布号 |
US7938980(B2) |
申请公布日期 |
2011.05.10 |
| 申请号 |
US20070978225 |
申请日期 |
2007.10.26 |
| 申请人 |
FORSCHUNGSZENTRUM KARLSRUHE GMBH |
发明人 |
WONG SEAN;VON FREYMANN GEORG;WEGENER MARTIN;OZIN GEOFFREY ALAN |
| 分类号 |
B44C1/22;C03C15/00;C03C25/68;C23F1/00;C25F3/00 |
主分类号 |
B44C1/22 |
| 代理机构 |
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| 主权项 |
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