| 摘要 |
An exposure apparatus for exposing a substrate to radiation based on parameters. The apparatus includes a display, an input device, and a processor configured to execute a program for editing the parameters. The processor is configured to cause, in accordance with the program, the display to display a first group of a first classification name for classifying the parameters, a plurality of names of works to be executed by the apparatus, a second group of a second classification name for classifying the parameters, a plurality of names of functions, each of which is contained in at least one of the works, and contents of parameters corresponding to a combination of one of the plurality of names of works of the first classification name and one of the plurality of names of functions of the second classification name, respectively selected by the input device.
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