| 摘要 |
FIELD: chemistry. ^ SUBSTANCE: disclosed is a fast setting heat-resistant phosphorus-nitrogen-containing organosilicon lacquer, consisting of a film-forming agent (mixture of a product of reaction of 3-aminopropyl-triethoxy silane (29-47 wt %) and triphenyl phosphate (21-33 wt %) with octamethyl-cyclotetrasiloxane (20-50 wt %) and a solvent, and a method of producing said lacquer, involving preparation a film-forming agent and diluting it with a solvent to the required consistence. Synthesis of the film-forming agent takes place without release of intermediate products, which enables use of the synthesis method in industrial production. Dilution with polar (diethyl ether, tetrahydrofuran, ethyl alcohol, ethyl cellosolve, chloroform) and non-polar (toluene) solvent enables variation of the coating thickness between 5 and 100 mcm. Hardening at temperature higher than 100C may be very fast (10-15 min), which enables use of the lacquer in automatic coating lines in on the factory floor. The lacquer enables to obtain transparent coatings, which retain that quality when heated to 200C. Owing to fast setting when heated, inscriptions on coated components are not washed off even when organic solvents are used for dilution. The lacquer is also resistant to UV and visible light, organic solvents and is heat- and water-resistant. ^ EFFECT: preparation of a coating which is resistant to UV and visible light, organic solvents, heat- and water-resistance, as well as a process for obtaining said coating. ^ 2 cl, 3 dwg, 2 tbl, 9 ex |
