发明名称 Nitride semiconductor device including an electrode in ohmic contact with a P-type nitride semiconductor contact layer
摘要 A nitride semiconductor device with a p electrode having no resistance between itself and other electrodes, and a method of manufacturing the same are provided. A p electrode is formed of a first Pd film, a Ta film, and a second Pd film, which is an antioxidant film for preventing oxidation of the Ta film, and on a p-type contact layer of a nitride semiconductor. On the second Pd film, a pad electrode is formed. The second Pd film as an antioxidant film is formed on the entire upper surface of the Ta film which forms the p electrode, to prevent oxidation of the Ta film. This inhibits the resistance between the p electrode and the pad electrode, thereby preventing a failure in contact between the p electrode and the pad electrode and providing the low-resistance p electrode.
申请公布号 US7939943(B2) 申请公布日期 2011.05.10
申请号 US20080268509 申请日期 2008.11.11
申请人 MITSUBISHI ELECTRIC CORPORATION 发明人 SHIOZAWA KATSUOMI;KANAMOTO KYOZO;OISHI TOSHIYUKI;KUROKAWA HIROSHI;OHTSUKA KENICHI;TARUI YOICHIRO;TOKUDA YASUNORI
分类号 H01L23/48;H01L29/43 主分类号 H01L23/48
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