发明名称 |
Method and apparatus for spacer-optimization (S-O) |
摘要 |
The invention can provide a method of processing a substrate using S-O processing sequences and evaluation libraries that can include one or more optimized spacer creation and evaluation procedures.
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申请公布号 |
US7939450(B2) |
申请公布日期 |
2011.05.10 |
申请号 |
US20070859507 |
申请日期 |
2007.09.21 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
YAMASHITA ASAO;FUNK MERRITT;PRAGER DANIEL J.;CHEN LEE;SUNDARARAJAN RADHA |
分类号 |
H01L21/302;H01L21/461 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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