| 摘要 |
A pattern drawing apparatus which is capable of reducing manufacturing costs of information recording media. A partial drawing process is executed in response to output of a reference signal, for drawing, after being on standby for a predetermined standby time period, pattern segments, which are obtained by dividing patterns forming a servo pattern in the direction of the width of the patterns, by irradiation of a resin layer with an electron beam. A drawing position-changing process is executed for changing the irradiation position of the electron beam on the resin, toward a center of rotation of a substrate or away from the center of rotation, within a range of the effective drawing width of the electron beam. These processes are executed a plurality of times to draw an exposure pattern on the resin layer.
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