发明名称 VAPOR DEPOSITION MATERIAL FOR ORGANIC DEVICE, ORGANIC DEVICE, AND METHOD OF MANUFACTURING THE SAME
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a vapor deposition material for an organic device which is excellent in stability of vapor deposition speed and can uniformly deposit a film including an organic compound of a large area and can reduce fluctuation of performance of the organic device, to provide an organic device using the vapor deposition material for an organic device, and to provide a method of manufacturing the same. <P>SOLUTION: The vapor deposition material for an organic device, used for manufacture of the organic device, is one sublimed and refined vapor by forming an organic layer through vapor deposition based on a flash vapor deposition method, with an average particle diameter expressed in D50% of 10-200μm, and a uniformity expressed in D60% diameter/D10% diameter of 1.0-4.0. <P>COPYRIGHT: (C)2011,JPO&INPIT</p>
申请公布号 JP2011091025(A) 申请公布日期 2011.05.06
申请号 JP20100171610 申请日期 2010.07.30
申请人 FUJIFILM CORP 发明人 HAYASHI MASAYUKI
分类号 H05B33/10;C23C14/24;H01L51/50 主分类号 H05B33/10
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