发明名称 MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of a semiconductor device which forms a UV-cure resin material wherein a satisfactory concave and convex pattern is transferred and hardened. SOLUTION: A semiconductor substrate and a transparent stamper are brought into contact with each other via a coating layer made of the uncured UV-cure resin material for pattern transfer containing an isobornyl acrylate, an acrylate which has a fluorene skeleton, a multifunctional acrylate, and a polymerization starter. Then, the coating layer made of the uncured UV-cure resin material is irradiated with UV to be hardened. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011090775(A) 申请公布日期 2011.05.06
申请号 JP20100273321 申请日期 2010.12.08
申请人 TOSHIBA CORP 发明人 UMEZAWA KAZUYO;MORITA SEIJI;SUGIMURA SHINOBU;SAKURAI MASATOSHI
分类号 G11B5/84;C08F2/48;C08F220/10;H01L21/027 主分类号 G11B5/84
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