BASE GENERATING AGENT, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN-FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN AND ARTICLE USING THE PHOTOSENSITIVE RESIN COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a photosensitive resin composition excellent in resolution, obtainable at low cost, and containing a polymer precursor which has a wide range of options applicable in terms of structure and whose reaction to a final product is facilitated by a basic substance or by heating in the presence of a basic substance, and a base generating agent usable for such a photosensitive resin composition.

SOLUTION: The photosensitive resin composition includes a base generating agent having a specific structure, and generating a base by irradiating with electromagnetic waves and heating, and a polymer precursor whose reaction to a final product is facilitated by the base generating agent and a basic substance or by heating in the presence of a basic substance.

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