| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which is excellent in sensitivity, resolution and exposure margin and also satisfies MEEF performance, and to provide a low-molecular compound suitably used in the radiation-sensitive resin composition. <P>SOLUTION: The radiation-sensitive resin composition includes (A) an acid dissociable group-containing nitrogen compound having a specific structure, (B) a resin which is alkali-insoluble or scarcely soluble in alkali, and is protected by an acid dissociable group, and which becomes alkali-soluble upon dissociation of the acid dissociable group, and (C) a radiation-sensitive acid generator. <P>COPYRIGHT: (C)2011,JPO&INPIT |
