| 摘要 |
<p>1,087,676. Etching. INTERNATIONAL BUSINESS MACHINES CORPORATION. July 14, 1966 [July 23, 1965], No. 31582/66. Heading B6J. Apparatus for polishing by etching semiconductor material such as germanium or gallium arsenide comprises a polishing disc 1 having an upper polishing surface 5 of fibrous, felt-like material rotating about an axis inclined (e.g. 3 degrees) to the vertical, and a holder 6 for bodies to be etched rotating on the lower part of the surface 5. The holder is rotated by the disc through a pulley 14 at a faster peripheral speed than the drum and its lower surface is adapted to receive the bodies embedded in wax to protect their edges. Etching liquid is delivered from a container 28 on to the disc at a rate controlled by a device 30 and gravitated to the area below the holder, some being retained in a recess in the lower surface thereof. Excess liquid is drained away into a groove 22 and through ports 21. The pressure of the bodies against the disc is adjusted by a screw 12, and the pressure of the pulley against the holder by a screw 18. The etchant may be sodium hypochlorite; the time 100-130 minutes, and the wax glycol phthalate.</p> |
