| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method of measuring wavefront aberration and a wavefront aberration measuring instrument with wavefront aberration measuring accuracy enhanced. <P>SOLUTION: This method of measuring wavefront aberration for measuring wavefront aberration by inputting light emitted from a light source into an inspected lens to detect light having passed through the inspected lens, includes a process for measuring wavefront aberration with the aperture of the inspected lens opened, a process for measuring the pupil center position of the inspected lens with the aperture of the inspected lens reduced, and a process for polynomially expanding the wavefront aberration with the pupil center position used as an origin. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
