| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a mask inspection device that can improve the defect detection sensitivity. <P>SOLUTION: The mask inspection device 100 includes: a light source 10 irradiating a mask 20 having a first pattern and a second pattern formed therein, which are approximately the same, with approximately the same plurality of illumination beams; photodetectors detecting a plurality of exiting beams from the first pattern and the second pattern each irradiated with the plurality of illumination beams; and a determination unit 17, which calculates a first defect determination signal by using one of exiting beams from the first pattern and one of exiting beams from the second pattern in the plurality of exiting beams, calculates a second defect determination signal by using one of exiting beams from the first pattern except for the exiting beam used for calculation of the first defect determination signal, and by using one of exiting beams from the second pattern, and determines a defect by using the first defect determination signal and the second defect determination signal. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
