发明名称 |
Semiconductor Device and A Method of Manufacturing the Same |
摘要 |
A reduction in contaminating impurities in a TFT, and a TFT which is reliable, is obtained in a semiconductor device which uses the TFT. By removing contaminating impurities residing in a film interface of the TFT using a solution containing fluorine, a reliable III can be obtained.
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申请公布号 |
US2011101367(A1) |
申请公布日期 |
2011.05.05 |
申请号 |
US201113005728 |
申请日期 |
2011.01.13 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., LTD |
发明人 |
KADONO MASAYA;YAMAZAKI SHUNPEI;YAMAUCHI YUKIO;KITAKADO HIDEHITO |
分类号 |
H01L29/786 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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