发明名称 |
COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND INKJET RECORDING METHOD |
摘要 |
An embodiment of the composition contains any of compounds of the formula A-LG in which A represents any of residues of general formula (A-1) below and LG represents any of groups that are cleaved to generate acids of the formula A-H when acted on by an acid. The composition further contains at least one of a compound that generates an acid when exposed to actinic rays or radiation and a compound that generates an acid when heated.
|
申请公布号 |
US2011102528(A1) |
申请公布日期 |
2011.05.05 |
申请号 |
US20100914762 |
申请日期 |
2010.10.28 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
TSUCHIMURA TOMOTAKA;KAWABATA TAKESHI;ITO TAKAYUKI |
分类号 |
B41J2/01;C07C311/09;C07D317/14;C07D317/58;C07D317/72;C07D319/06;C07D405/12;G03F7/004;G03F7/20 |
主分类号 |
B41J2/01 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|