发明名称 |
OBERFLÄCHENPLASMAGASVERARBEITUNG |
摘要 |
<p>The invention relates to a gas processing unit adapted for generating a surface plasma in the vicinity of a photocatalyst, that has a planar configuration. The photocatalyst is deposited in the form of a thin layer on a dielectric substrate and at least one plasma supply electrode is formed above the photocatalyst thin layer. Such a configuration increases the interaction between the plasma and the photocatalyst. The unit can be used for a gas processing of the pollution-control, odour reduction or bactericidal treatment type with a high efficiency.</p> |
申请公布号 |
DE602008005739(D1) |
申请公布日期 |
2011.05.05 |
申请号 |
DE20086005739T |
申请日期 |
2008.06.24 |
申请人 |
ECOLE POLYTECHNIQUE;CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS) |
发明人 |
ROUSSEAU, ANTOINE;ALLEGRAUD, KATIA;GUAITELLA, OLIVIER |
分类号 |
B01D53/32 |
主分类号 |
B01D53/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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