发明名称 SILICON CARBIDE SUBSTRATE PRODUCTION METHOD AND SILICON CARBIDE SUBSTRATE
摘要 <p>Disclosed is a production method for a silicon carbide substrate (1) involving a process for preparing a plurality of SiC substrates (20) comprising monocrystalline silicon carbide, a process for forming a base layer (10) of silicon carbide that holds the plurality of SiC substrates (20) in a state in which the plurality of SiC substrates (20) are arranged side by side in plan view, and a process for forming filling portions (60) that fill the spaces between said plurality of SiC substrates (20).</p>
申请公布号 WO2011052321(A1) 申请公布日期 2011.05.05
申请号 WO2010JP66704 申请日期 2010.09.27
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD.;HARADA, SHIN;SASAKI, MAKOTO;NISHIGUCHI, TARO;TAMASO, HIDETO;NAMIKAWA, YASUO 发明人 HARADA, SHIN;SASAKI, MAKOTO;NISHIGUCHI, TARO;TAMASO, HIDETO;NAMIKAWA, YASUO
分类号 H01L21/02;C30B29/36;H01L21/20;H01L21/205;H01L21/336;H01L29/12;H01L29/78 主分类号 H01L21/02
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