SILICON CARBIDE SUBSTRATE PRODUCTION METHOD AND SILICON CARBIDE SUBSTRATE
摘要
<p>Disclosed is a production method for a silicon carbide substrate (1) involving a process for preparing a plurality of SiC substrates (20) comprising monocrystalline silicon carbide, a process for forming a base layer (10) of silicon carbide that holds the plurality of SiC substrates (20) in a state in which the plurality of SiC substrates (20) are arranged side by side in plan view, and a process for forming filling portions (60) that fill the spaces between said plurality of SiC substrates (20).</p>
申请公布号
WO2011052321(A1)
申请公布日期
2011.05.05
申请号
WO2010JP66704
申请日期
2010.09.27
申请人
SUMITOMO ELECTRIC INDUSTRIES, LTD.;HARADA, SHIN;SASAKI, MAKOTO;NISHIGUCHI, TARO;TAMASO, HIDETO;NAMIKAWA, YASUO