| 摘要 |
A method involves forming a first surface on a substrate, applying to the first surface a layer of a material having a thickness less than approximately 10 microns, and precision polishing the layer of material to form a precision optical second surface on a side of the layer opposite from the substrate. A different aspect involves an apparatus that includes a substrate having a first surface, and a layer provided on the surface and having a thickness less than approximately 10 microns, the layer having on a side thereof opposite from the substrate a polished second surface with an RMS surface roughness less than approximately 10 Angstroms.
|
