发明名称 |
HOT EDGE RING WITH SLOPED UPPER SURFACE |
摘要 |
A hot edge ring with extended lifetime comprises an annular body having a sloped upper surface. The hot edge ring includes a step underlying an outer edge of a semiconductor substrate supported in a plasma processing chamber wherein plasma is used to process the substrate. The step includes a vertical surface which surrounds the outer edge of the substrate and the sloped upper surface extends upwardly and outwardly from the upper periphery of the vertical surface.
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申请公布号 |
US2011104884(A1) |
申请公布日期 |
2011.05.05 |
申请号 |
US20100917969 |
申请日期 |
2010.11.02 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
KOSHIISHI AKIRA;MANI SATHYA;BHATTACHARYYA GAUTAM;BETTENCOURT GREGORY R.;CHAO SANDY |
分类号 |
H01L21/443;H01L21/465;H01L21/469 |
主分类号 |
H01L21/443 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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