发明名称 HOT EDGE RING WITH SLOPED UPPER SURFACE
摘要 A hot edge ring with extended lifetime comprises an annular body having a sloped upper surface. The hot edge ring includes a step underlying an outer edge of a semiconductor substrate supported in a plasma processing chamber wherein plasma is used to process the substrate. The step includes a vertical surface which surrounds the outer edge of the substrate and the sloped upper surface extends upwardly and outwardly from the upper periphery of the vertical surface.
申请公布号 US2011104884(A1) 申请公布日期 2011.05.05
申请号 US20100917969 申请日期 2010.11.02
申请人 LAM RESEARCH CORPORATION 发明人 KOSHIISHI AKIRA;MANI SATHYA;BHATTACHARYYA GAUTAM;BETTENCOURT GREGORY R.;CHAO SANDY
分类号 H01L21/443;H01L21/465;H01L21/469 主分类号 H01L21/443
代理机构 代理人
主权项
地址