发明名称 Inspection Apparatus for Lithography
摘要 Four separately polarized beams are simultaneously measured upon diffraction from a substrate (W) to determine properties of the substrate. Linearly, circularly or elliptically polarized radiation is transmitted through a first beam splitter (N-PBS) and split into two polarized beams. These two beams are further split into two further beams using two further beam splitters, the further beam splitters (32,34) being rotated by 45° with respect to each other. The plurality of polarizing beam splitters enables the measurement of the intensity of all four beams and thus the measurement of the phase modulation and amplitude of the combined beams to give the features of the substrate. Algorithms are used to compare the four intensities of each of the polarized angles to give rise to the phase difference between the polarization directions and the ratio between the two main polarization direction amplitudes of the original polarized beam.
申请公布号 US2011102793(A1) 申请公布日期 2011.05.05
申请号 US20090922587 申请日期 2009.03.24
申请人 ASML NETHERLANDS B.V. 发明人 STRAAIJER ALEXANDER
分类号 G01J4/00 主分类号 G01J4/00
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