发明名称 METHOD FOR PRODUCING SOLAR CELL
摘要 <p>The occurrence of internal stress is reduced during the solar cell production process, thereby reducing crystal defects and recombination loss. Provided is a method for producing solar cells having a p-n junction, which involves a step for forming a p-type layer on a semiconductor substrate by coating a diffusion coating solution containing impurities which function as acceptors, and by diffusing the impurities by means of thermal diffusion and/or a step for forming an n-type layer on a semiconductor substrate by coating a diffusion coating solution containing impurities which function as donors, and by diffusing the impurities by means of thermal diffusion.</p>
申请公布号 WO2011052465(A1) 申请公布日期 2011.05.05
申请号 WO2010JP68563 申请日期 2010.10.21
申请人 HITACHI CHEMICAL COMPANY, LTD.;OKANIWA, KAORU 发明人 OKANIWA, KAORU
分类号 H01L31/04 主分类号 H01L31/04
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