发明名称 METHOD AND DEVICE FOR DETECTING CRACKS IN SEMICONDUCTOR SUBSTRATES
摘要 The invention relates to a method and device for detecting cracks in planar semiconductor substrates having two opposite lateral surfaces (30, 31) and a circumferential edge surface, such as silicon wafers and solar cells. The method and device are based on the detection of light refracted at a crack (34), which light is introduced into the edge surface of the semiconductor substrate (3) and exits at the crack location on one of the lateral surfaces.
申请公布号 WO2011050873(A1) 申请公布日期 2011.05.05
申请号 WO2010EP04980 申请日期 2010.08.13
申请人 SCHOTT AG;ORTNER, ANDREAS;GERSTNER, KLAUS;VON CAMPE, HILMAR;STELZL, MICHAEL 发明人 ORTNER, ANDREAS;GERSTNER, KLAUS;VON CAMPE, HILMAR;STELZL, MICHAEL
分类号 G01N21/95 主分类号 G01N21/95
代理机构 代理人
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