| 摘要 |
PURPOSE: A device and method for silver element plasma ion injection capable of the improvement of anti-microbial property are provided to generate high density silver plasma by applying very high electricity at the moment when the pulse is applied. CONSTITUTION: A device for silver element plasma ion injection comprises a vacuum chamber(110), a magnetron deposition(120), a sample mount(130), a first power source feeding member and a second power source feeding member. The vacuum chamber keeps the inside under vacuum condition. The magnetron deposition performs thin film deposition. The sample mount is installed in the location facing the deposition within the vacuum chamber and mount a simple. The first power source feeding member applies the pulse direct current electricity in the deposition. The second power source feeding member accelerates the plasma ions of the elemental silver towards sample.
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