| 摘要 |
PURPOSE: A positive type resist composition, a method for forming a resist pattern, and a polymer compound are provided to suppress the generation of defects and improve the critical dimension uniformity of the resist pattern. CONSTITUTION: A positive type resist composition includes a base component and an acid generating component. The solubility of the base component is increased with respect to alkaline developing liquid by the action of acid. The acid generating component generates acid by an exposing operation. The base component includes a polymer in which a0 unit of a chemical formula a0-1 and a1 unit derived from acrylic acidester. |
