摘要 |
PURPOSE: A substrate processing device is provided to vertically support the edges of a heater by the body of a reinforcing unit or a cylinder tube, thereby preventing a drooping phenomenon in the edges of the heater. CONSTITUTION: A processing chamber(110) provides a space for processing a substrate(10). A gas supply unit(130) supplies a processing gas to the substrate. A heater(120) is arranged in the processing chamber to heat the substrate. The support member supports the central part of the heater. A plurality of reinforcing units(140) vertically supports the edges of the heater.
|