发明名称 Apparatus for processing a substrate
摘要 PURPOSE: A substrate processing device is provided to vertically support the edges of a heater by the body of a reinforcing unit or a cylinder tube, thereby preventing a drooping phenomenon in the edges of the heater. CONSTITUTION: A processing chamber(110) provides a space for processing a substrate(10). A gas supply unit(130) supplies a processing gas to the substrate. A heater(120) is arranged in the processing chamber to heat the substrate. The support member supports the central part of the heater. A plurality of reinforcing units(140) vertically supports the edges of the heater.
申请公布号 KR20110045327(A) 申请公布日期 2011.05.04
申请号 KR20090101847 申请日期 2009.10.26
申请人 发明人
分类号 H01L21/324;H01L21/68 主分类号 H01L21/324
代理机构 代理人
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