| 摘要 |
PURPOSE: A gas jetting unit and organic metal chemical vapor deposition device with the same are provided to increase the contact time between a reaction gas and a substrate surface, thereby increasing membrane quality and deposition speed. CONSTITUTION: A process chamber(101) provides a space for a deposition process. A heater unit(105) heats a substrate(10) in the lower part of a susceptor(102). A gas jetting unit(103) comprises a nozzle unit(132) and an air knife(133). The nozzle unit comprises a first nozzle jetting a precursor gas and a second nozzle jetting a carrier gas. The air knife jets a fuzzy gas.
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