| 摘要 |
PURPOSE: A plasma processing apparatus and plasma processing method are provided to increase the uniformity of a plasma process by controlling the plasma density distribution. CONSTITUTION: A plasma is created as a doughnut shape under the dielectric window(52). The doughnut shape plasma is dispersed in a wide processing space. The density of the plasma is equalized in the susceptor(12) area. A correction ring(70) performs electromagnetic field correction about the RF magnetic field created from the RF antenna. A conduction duty ratio is varied by a switching device(110) by the process condition. |
