| 摘要 |
<p>PURPOSE: A lithographic apparatus and patterning device are provided to correct a plant at a frequency higher than the bandwidth of a controller, thereby correcting the lens vibration of a high frequency without damaging the stability of a control loop. CONSTITUTION: Two wedges(WG1, WG2) are placed in a patterning device(MA). Beams arrive at each first grid provided onto a substrate. Some measured beams are reflected from the first grid to a projecting system. Detectors detect each measured beam. The substrate performs scanning in a direction vertical to the ground.</p> |
