| 摘要 |
PURPOSE: A substrate processing apparatus is provided to include a heating device in a shutter, thereby uniformly maintaining the temperature in a chamber, thereby increasing the uniformity of a film thickness. CONSTITUTION: A processing chamber includes a substrate input/output hole. A shutter(10) opens and closes the substrate input/output hole. The shutter includes a shutter body(11) and a shutter support unit(12). A heating module heats the shutter. A temperature controller(22) controls the temperature of the heating module.
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