发明名称 Non-volatile memory devices and methods of fabricating the same
摘要 A memory device may include a switching device and a storage node coupled with the switching device. The storage node may include a first electrode, a second electrode, a data storage layer and at least one contact layer. The data storage layer may be disposed between the first electrode and the second electrode and may include a transition metal oxide or aluminum oxide. The at least one contact layer may be disposed at least one of above or below the data storage layer and may include a conductive metal oxide.
申请公布号 US7936044(B2) 申请公布日期 2011.05.03
申请号 US20060403902 申请日期 2006.04.14
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM DONG CHUL;YOO IN-KYEONG;LEE MYOUNG-JAE;SEO SUN-AE;BAEK IN-GYU;AHN SEUNG-EON;PARK BYOUNG-HO;CHA YOUNG-KWAN;PARK SANG-JIN
分类号 H01L29/00 主分类号 H01L29/00
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