| 发明名称 |
Plasma processing apparatus |
| 摘要 |
A plasma processing apparatus is described and which includes a chamber having at least two processing stations which are separated by a wall. At least one channel is formed in the wall, and wherein the channel has a width to length ratio of less than about 1:3.
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| 申请公布号 |
US7935186(B2) |
申请公布日期 |
2011.05.03 |
| 申请号 |
US20060441290 |
申请日期 |
2006.05.24 |
| 申请人 |
ADVANCED MICRO-FABRICATION EQUIPMENT, INC. ASIA |
发明人 |
QIAN QING |
| 分类号 |
C23C16/00;C23F1/00;H01L21/306 |
主分类号 |
C23C16/00 |
| 代理机构 |
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