发明名称 |
Ion beam irradiating apparatus, and method of producing semiconductor device |
摘要 |
An ion beam irradiating apparatus has a field emission electron source 10 which is disposed in a vicinity of a path of the ion beam 2, and which emits electrons 12. The field emission electron source 10 is placed in a direction along which an incident angle formed by the electrons 12 emitted from the electron source 10 and a direction parallel to the traveling direction of the ion beam 2 is in the range from −15 deg. to +45 deg. (an inward direction of the ion beam 2 is +, and an outward direction is −).
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申请公布号 |
US7935944(B2) |
申请公布日期 |
2011.05.03 |
申请号 |
US20070304241 |
申请日期 |
2007.06.12 |
申请人 |
KYOTO UNIVERSITY;NISSIN ION EQUIPMENT CO., LTD. |
发明人 |
ISHIKAWA JUNZO;NICOLAESCU DAN;GOTOH YASUHITO;SAKAI SHIGEKI |
分类号 |
G21G1/10 |
主分类号 |
G21G1/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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