发明名称 Projection optical system, exposure apparatus, and exposure method
摘要 An immersion projection optical system that prevents leakage of a liquid (immersion liquid) into the optical system and maintains satisfactory imaging capability. The projection optical system of the present invention is a projection optical system that projects a reduced image of a first plane onto a second plane through a liquid. The projection optical system includes an interface optical lens (Lb) having a side towards the first plane that contacts a gas and a side towards the second plane that contacts the liquid. The interface optical element includes a light entering surface (Lba), which has a convex shape facing towards the first plane, and a groove (Gr), which is formed to surround an effective region in a light emitting surface of the interface optical element.
申请公布号 US7936441(B2) 申请公布日期 2011.05.03
申请号 US20060920331 申请日期 2006.05.08
申请人 NIKON CORPORATION 发明人 OMURA YASUHIRO
分类号 B60R1/06;G02B7/02;G03B27/42;G03B27/52;G03B27/54 主分类号 B60R1/06
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