发明名称 Photoelectric conversion device and manufacturing method of the same, and a semiconductor device
摘要 A photo-sensor having a structure which can suppress electrostatic discharge damage is provided. Conventionally, a transparent electrode has been formed over the entire surface of a light receiving region; however, in the present invention, the transparent electrode is not formed, and a p-type semiconductor layer and an n-type semiconductor layer of a photoelectric conversion layer are used as an electrode. Therefore, in the photo-sensor according to the present invention, resistance is increased an electrostatic discharge damage can be suppressed. In addition, positions of the p-type semiconductor layer and the n-type semiconductor layer, which serve as an electrode, are kept away; and thus, resistance is increased and withstand voltage can be improved.
申请公布号 US7936037(B2) 申请公布日期 2011.05.03
申请号 US20090355187 申请日期 2009.01.16
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 NISHI KAZUO;SUGAWARA YUUSUKE;TAKAHASHI HIRONOBU;ARAO TATSUYA
分类号 H01L31/102;H01L27/14 主分类号 H01L31/102
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