| 摘要 |
PURPOSE: A substrate processing device is provided to properly adjust heat transferred from a lower edge of a chamber to the central area of the chamber, thereby keeping the temperature of a susceptor uniform. CONSTITUTION: A chamber(100) comprises a reaction space. A substrate placing unit(200) places a substrate(10). A first heating unit(421) heats the central area(101) of the reaction space. A second heating unit(423) heats an edge of the reaction space. A blocking unit(430) partially blocks heat transferred to the central area of the reaction space.
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