| 摘要 |
PURPOSE: A substrate processing device is provided to fix a side wall by a support shaft to increase the coupling force between a warmth keeping cap and a rotation shaft, thereby preventing a process gas from being inserted into the gap between the warmth keeping cap and the rotation shaft. CONSTITUTION: A chamber(100) comprises a reaction space. A substrate mounting unit(200) mounts a substrate in the chamber. A rotation shaft unit(400) rotates the substrate mounting unit. A temperature measuring unit(500) measures the temperature of the substrate. A warmth keeping cap(600) caps the surface of the rotation shaft unit.
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