| 摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor inspection device and method that minimize damage to a semiconductor substrate due to illumination light (UV light) in the ultraviolet range thereby achieving inspection or observation using an image of high resolution or resolving power, and achieving efficient inspection etc., using UV light suitable to a semiconductor manufacturing process. SOLUTION: The semiconductor inspection device includes: a stage that mounts the semiconductor substrate thereon and moves it in a horizontal direction, the semiconductor substrate having a circuit pattern formed therein; a light source for irradiating an inspection object region of the semiconductor substrate with the UV light; a means of blocking the UV light irradiating the inspection object region; a means of storing an allowable irradiation time of the UV light at which the semiconductor substrate is not damaged, the allowable irradiation time being made to correspond to properties of the semiconductor substrate in respective inspection processes of inspecting the semiconductor substrate; and a means of performing control to irradiate the inspection object region with the UV light for the stored allowable irradiation time by detecting the stage stopping and to block the UV light upon the termination of the allowable irradiation time. COPYRIGHT: (C)2011,JPO&INPIT |
