发明名称 WAVE ABERRATION MEASURING METHOD AND WAVE ABERRATION MEASURING DEVICE
摘要 <p>Disclosed is a wave aberration measuring method in which wave aberration is measured with improved measuring accuracy by applying light emitted from a light source onto a lens to be tested and by detecting light transmitted through the lens to be tested. The method comprises a step of measuring wave aberration while the diaphragm of the lens to be tested is open; a step of measuring the central position of the pupil of the lens to be tested while the diaphragm of the lens to be tested is closed; and a step of expanding the wave aberration to a polynomial using the central position of the pupil as an origin. Also disclosed is a wave aberration measuring device.</p>
申请公布号 WO2011049075(A1) 申请公布日期 2011.04.28
申请号 WO2010JP68347 申请日期 2010.10.19
申请人 NIKON CORPORATION;TANAKA, ISSEI 发明人 TANAKA, ISSEI
分类号 G01M11/02 主分类号 G01M11/02
代理机构 代理人
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