发明名称 |
WAVE ABERRATION MEASURING METHOD AND WAVE ABERRATION MEASURING DEVICE |
摘要 |
<p>Disclosed is a wave aberration measuring method in which wave aberration is measured with improved measuring accuracy by applying light emitted from a light source onto a lens to be tested and by detecting light transmitted through the lens to be tested. The method comprises a step of measuring wave aberration while the diaphragm of the lens to be tested is open; a step of measuring the central position of the pupil of the lens to be tested while the diaphragm of the lens to be tested is closed; and a step of expanding the wave aberration to a polynomial using the central position of the pupil as an origin. Also disclosed is a wave aberration measuring device.</p> |
申请公布号 |
WO2011049075(A1) |
申请公布日期 |
2011.04.28 |
申请号 |
WO2010JP68347 |
申请日期 |
2010.10.19 |
申请人 |
NIKON CORPORATION;TANAKA, ISSEI |
发明人 |
TANAKA, ISSEI |
分类号 |
G01M11/02 |
主分类号 |
G01M11/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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