CYCLIC (METH)ACRYLATES AND PROCESS FOR PREPARATION THEREOF
摘要
<p>Provided are (meth)acrylate monomers which have cyclic structures and which exhibit excellent photosensitivity, good air-drying properties, high hardness, and low viscosity. Also provided are polymerizable resin compositions containing the same. Cyclic (meth)acrylates that have structures represented by general formula (1) [wherein R1s are each a hydrogen atom or (meth)acryloyl, with at least one R1 being (meth)acryloyl; A is C2-4 alkylene; and n is a number of 0 to 30].</p>