发明名称 CYCLIC (METH)ACRYLATES AND PROCESS FOR PREPARATION THEREOF
摘要 <p>Provided are (meth)acrylate monomers which have cyclic structures and which exhibit excellent photosensitivity, good air-drying properties, high hardness, and low viscosity. Also provided are polymerizable resin compositions containing the same. Cyclic (meth)acrylates that have structures represented by general formula (1) [wherein R1s are each a hydrogen atom or (meth)acryloyl, with at least one R1 being (meth)acryloyl; A is C2-4 alkylene; and n is a number of 0 to 30].</p>
申请公布号 WO2011048739(A1) 申请公布日期 2011.04.28
申请号 WO2010JP05430 申请日期 2010.09.03
申请人 DAI-ICHI KOGYO SEIYAKU CO., LTD.;TAKAMURA, NAOHIRO;KIKUTA, MANABU;KITAZAWA, MAKI 发明人 TAKAMURA, NAOHIRO;KIKUTA, MANABU;KITAZAWA, MAKI
分类号 C07D493/04;C08G65/332 主分类号 C07D493/04
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