| 摘要 |
PROBLEM TO BE SOLVED: To provide an imprint apparatus which prevents the deterioration of overlay accuracy of a pattern caused by the driving of a stage, and can perform, as well as, a proper demolding process. SOLUTION: The imprint apparatus includes a mold and a stage that holds a substrate, executing a curing process of curing a resin, while the mold is pressed to the substrate via the resin applied to the substrate, and a demolding process of releasing the mold from the resin cured in the curing process, having a structure that holds the mold; a pillar that supports the structure mechanically, independently from the stage via an anti-vibration mount that reduces the propagation of vibration; and a force-imparting unit that imparts to the structure, a force in an opposite direction, from the direction of the force generated in the structure by an imparting demolding force to the mold during the demolding process. COPYRIGHT: (C)2011,JPO&INPIT |
