发明名称 CONTROL METHOD OF COATING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a control method of a coating apparatus which shortens the overall process time without repeating the process for controlling a gap between a substrate and a nozzle by elevating and lowering a dispenser two or more times during the process to form a plurality of patterns on the substrate. SOLUTION: In the control method of the coating apparatus having a syringe to store raw materials, a nozzle to discharge the raw materials on the substrate and a valve to control the communication between the syringe and the nozzle, and being equipped with the dispenser to separately form a plurality of patterns, the method comprises steps of horizontally transferring the dispenser and discharging the raw materials on the substrate to form a plurality of patterns, and equalizing the gap between the substrate and the nozzle when the raw materials are discharged on the substrate with the gap between the substrate and the nozzle when the raw materials are not discharged on the substrate to horizontally transfer the dispenser. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011083771(A) 申请公布日期 2011.04.28
申请号 JP20100231468 申请日期 2010.10.14
申请人 AP SYSTEMS INC 发明人 LEE GEUN DEOK;KIM JUNG DU;JANG JAE NAM;CHOI JAE MAN
分类号 B05D3/00;B05D1/26 主分类号 B05D3/00
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