| 发明名称 |
METHOD AND INSTALLATION FOR PRODUCING AN ANTI-REFLECTION AND/OR PASSIVATION COATING FOR SEMICONDUCTOR DEVICES |
| 摘要 |
A method of producing an anti-reflection and/or passivation coating for semiconductor devices is provided. The method includes: providing a semiconductor device precursor 30 having a surface to be provided with the anti-reflection and/or passivation coating; treating the surface with ions; and depositing a hydrogen containing anti-reflection and/or passivation coating onto the treated surface. |
| 申请公布号 |
WO2011048069(A2) |
申请公布日期 |
2011.04.28 |
| 申请号 |
WO2010EP65674 |
申请日期 |
2010.10.19 |
| 申请人 |
APPLIED MATERIALS, INC.;AURIAC, NICOLAS;TRASSL, ROLAND |
发明人 |
AURIAC, NICOLAS;TRASSL, ROLAND |
| 分类号 |
H01L21/00;H01L21/02;H01L21/027 |
主分类号 |
H01L21/00 |
| 代理机构 |
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