发明名称 |
SUBSTRATE HOLDING APPARATUS, SUBSTRATE HOLDING METHOD, AND SUBSTRATE PROCESSING APPARATUS |
摘要 |
A substrate holding apparatus can meet the request for a smaller-sized compact apparatus while ensuring a sufficient immersion depth of a substrate in a processing liquid. The substrate holding apparatus includes: a substrate holder for supporting a substrate (W) by bringing a peripheral portion of a surface of the substrate (W) into contact with a first sealing member; and a substrate pressing section for lowering relative to the substrate holder so as to press the substrate (W) held by the substrate holder downward, thereby bringing a first sealing member into pressure contact with the substrate (W). The substrate pressing section is provided with a second ring-shaped sealing member which makes pressure contact with an upper surface of a ring-shaped holding section of the substrate holder, thereby sealing the peripheral region of the substrate pressing section.
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申请公布号 |
US2011094442(A1) |
申请公布日期 |
2011.04.28 |
申请号 |
US20110983474 |
申请日期 |
2011.01.03 |
申请人 |
SEKIMOTO MASAHIKO;KATSUOKA SEIJI;DAI NAOKI;WATANABE TERUYUKI;OGAWA TAKAHIRO;SUZUKI KENICHI;KOBAYASHI KENICHI;MOTOSHIMA YASUYUKI;KATO RYO |
发明人 |
SEKIMOTO MASAHIKO;KATSUOKA SEIJI;DAI NAOKI;WATANABE TERUYUKI;OGAWA TAKAHIRO;SUZUKI KENICHI;KOBAYASHI KENICHI;MOTOSHIMA YASUYUKI;KATO RYO |
分类号 |
B05C3/02;B05C13/00;H01L21/00;H01L21/687 |
主分类号 |
B05C3/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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