| 摘要 |
PROBLEM TO BE SOLVED: To control variations in a dose and an implantation depth of ion implantation resulting from a mismatch between an ion beam shape and a scan pitch. SOLUTION: The ion implantation device includes a defocusing section 205. The defocusing section 205 includes a convergent lens 206 for converging an ion beam 200 and a divergent lens 207 which enlarges the ion beam 200 converged by the convergent lens 206 by diverging it. COPYRIGHT: (C)2011,JPO&INPIT
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