LASER-REFLECTIVE MASK AND METHOD FOR MANUFACTURING SAME

摘要

The present invention relates to a laser-reflective mask and to a method for manufacturing same, and more particularly, to a laser-reflective mask and to a method for fabricating same that can facilitate mask processing and accurately form a pattern by sequentially and repetitively stacking reflective layers having different reflectivities on a baseboard in which reflective layer filling recesses having a predetermined depth are defined therein in a laser beam reflective region, and removing the stacked reflective layers from regions other than the portions filling the reflective layer filling recesses by means of a chemical mechanical polishing (CMP) process, laser beam irradiation, or a lift-off process with an etching solution, in order to form a reflective layer pattern that fills the recesses. The method for manufacturing a laser-reflective mask according to the present invention comprises the steps of: forming a sacrificial layer on a baseboard; forming a sacrificial layer pattern and reflective layer filling recesses having a predetermined depth by forming recesses in the sacrificial layer and the baseboard through an etching process on a region to become a laser beam reflective region on the baseboard; alternatingly and repetitively stacking a first reflective layer and a second reflective layer having mutually different reflectivities on the baseboard, on which the sacrificial layer pattern and the reflective layer filling recess are formed, until the reflective layer recesses are completely filled; forming a reflective layer pattern filling the reflective layer filling recesses by performing a laser lift-off process that irradiates a laser beam on the baseboard from a direction under the baseboard to remove the sacrificial layer pattern and the first and second reflective layers stacked on the sacrificial layer pattern; and removing a residual portion of the sacrificial layer pattern remaining on the baseboard.