发明名称 SUBSTRATE PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a technique for reducing the occurrence of heating unevenness in heat processing on a substrate while suppressing a remarkable increase in substrate processing cost. SOLUTION: A heating plate 9 is provided with a discharge port 101 for jetting a heated gas at a surface part opposed to the substrate 9. The discharge port 101 comprises: a first hole H1 having a relatively wide opening; and a second hole H2 communicating with the first hole H1 and an internal flow passage 102 and having a relatively narrow opening. Thus, the opening of the first hole H1 is relatively wide, so that air having passed through the second hole H2 is spread over the entire opening in the first hole H1, and consequently the flow velocity of the air jetting from the discharge port 101 can be reduced. Local heating of the substrate 9 is therefore reducible. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011086871(A) 申请公布日期 2011.04.28
申请号 JP20090240492 申请日期 2009.10.19
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 YOSHITANI MITSUAKI;YAMAOKA HIDETO;ABE HIROSHIGE;YONEYAMA NORITAKA;TANIGUCHI TAKESHI;SATO TAKAYUKI;NAKANE SHINGO;ISHIKAWA TOSHIJI
分类号 H01L21/027 主分类号 H01L21/027
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