| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a novel compound useful as an acid generator for resist composition, the acid generator formed of the compound, the resist composition containing the acid generator, and a method for forming a resist pattern using the resist composition. <P>SOLUTION: The resist composition contains a base component (A) whose solubility to an alkali developer changes by the action of an acid, and an acid generator component (B) which generates the acid by exposure. The acid generator component (B) contains an acid generator (B1) formed of a compound having a group represented by general formula (I) in a cation part, wherein R<SP>5</SP>represents an organic group having a carbonyl group, an ester bond or a sulfonyl group, and Q represents a divalent linking group. <P>COPYRIGHT: (C)2011,JPO&INPIT |
