发明名称 |
METHOD AND SYSTEM FOR DRYING A SUBSTRATE |
摘要 |
A method and system is described for drying a thin film on a substrate following liquid immersion lithography. Drying the thin film to remove immersion liquid from the thin film is performed prior to baking the thin film, thereby reducing the likely hood for interaction of immersion liquid with the baking process. This interaction has been shown to cause non-uniformity in critical dimension for the pattern formed in the thin film following the developing process. |
申请公布号 |
KR20110044333(A) |
申请公布日期 |
2011.04.28 |
申请号 |
KR20117007545 |
申请日期 |
2004.07.08 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
HO CHUNG PENG;NAFUS KATHLEEN;YOSHIOKA KAZ;YAMAGUCHI RICHARD |
分类号 |
H01L21/302;F26B;G02B21/00;G03C5/00;G03F7/20;G03F7/38;G21K5/08;G21K5/10 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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